EIPBN 2011 - 2011 International Symposium on Electron, Ion and Photon Beams and Nanofabrication (EIPBN 2011)

EIPBN ? the ‘THREE-BEAMS’ conference ? is recognized as the foremost international meeting dedicated to lithographic sciences and process technologies using election, ion or photon beams, with special emphasis on applications for micro- and nanofabrication techniques. The conference brings together engineers and scientists from all over the world to discuss recent progress and future trends.
Meeting Format

The conference opens on Tuesday afternoon with a special commercial session featuring vendors of equipment and materials relevant to the conference. There are plenary sessions on each of the following mornings, followed by three parallel sessions. The length of the presentation and discussion is 30 minutes for invited papers and 20 minutes for contributed papers.
A special feature of the technical program is the poster session that includes both invited and contributed papers. There is only one poster session but posters will be displayed for informal viewing throughout the entire conference.
Technical Scope

Abstracts representing high-quality original research are invited in the following areas:
Micro- and Nanolithography
. ? Electron-beam lithography
. ? Ion-beam patterning
. ? Optical lithography
. ? Nano-imprint lithography
. ? Extreme UV lithography
. ? Masked and maskless lithography
. ? Directed self-assembly
. ? Novel or emerging lithographic techniques
Process Technologies
. ? Electron or ion beam technologies
. ? Metrology and imaging
. ? Resists
. ? Pattern transfer
. ? Process simulation and modeling
. ? Novel beam-based processing
Applications
. ? Nanoelectronics
. ? Patterned media and data storage
. ? Nanophotonics
. ? Nanobiology
. ? Micro- and nano-fluidics
. ? Novel or emerging applications
Conference Registration

We strongly encourage you to register on line by using our website www.eipbn.org . Early registration rates and special student rates are available. The online registration system will be open in the fall of 2010.
Conference Location

The conference will be held at the JW Marriott Resort and Spa, close to the Red Rocks Canyon National Conservation Area and only 15 minutes from the world-famous Las Vegas Strip.
JW Marriott Resort and Spa
221 Rampart Blvd
Las Vegas, Nevada 89145 USA
Phone: 1-702-869-7777
Fax: 1-702-869-7339
Toll-free: 1-877-869-8777
Abstract Submission

The quality of the abstracts will form the basis for selection of papers for the conference and these will be peer reviewed according to the following criteria:
. ? originality of the work
. ? specific results achieved and described
. ? potential impact and interest to attendees
Abstracts should be submitted online at
www.eipbn.org
Abstracts are limited to one page of text (12 point or larger type) and a second, optional page with up to four figures.
Abstract deadline: January 10, 2011
Late submissions may be considered but only if they report truly outstanding results. Please prepare abstracts carefully and describe accomplishments specifically. Authors will be notified of acceptance by email by April 11, 2011.
Micrograph Contest

On a less technical level, EIPBN offers the opportunity to immortalize your favorite micrograph(s). Categories and previous winners are described on the conference web site, www.eipbn.org .
Manuscript Submission

Manuscripts must be submitted at the time of the conference and will be subjected to a critical peer review before they can be accepted for publication in the Nov/Dec issue of the Journal of Vacuum Science and Technology. Please note that authors are required to pay a publication charge of around $100 per page.
Conference Chair

Alan Brodie, Ph.D.
KLA-Tencor
One Technology Drive
M/S 5-3006J, Milpitas CA 95035
Phone: 408 875 1680
Fax: 408 875 7325
e-mail: alan.brodie-AT-kla-tencor.com
Program Chair

Prof. Richard Blaikie
Dept. Electrical and Computer Engineering
University of Canterbury
Private Bag 4800, Christchurch 8140
NEW ZEALAND
Phone: +64 3 364 3274
Fax: +64 3 364 2761
e-mail: richard.blaikie-AT-canterbury.ac.nz
Student Support

Limited funds are available to support student travel to the conference. The Conference Chair must receive a letter requesting support from the student’s advisor by January 10, 2011. PhD student and postdoc resumes will also be collected and distributed to potential employers by email.
Other Information

The EIPBN conference is incorporated as a nonprofit organization in the state of New Jersey and is co-sponsored by the American Vacuum Society (www.avs.org), in cooperation with the IEEE Electron Devices Society and Electro-optics Societies and the Optical Society of America (www.osa.org). It is organized by a steering committee that elects two new members each year from those that regularly attend the conference.