EIPBN 2010 - 2010 54th International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication (EIPBN)

Abstracts representing high quality original research are desired
for both poster and oral presentation
in the following areas:
Directed Assembly
Electron Beams
Emerging Technologies
Extreme UV Lithography
Focused Ion Beams
Mask and Maskless Lithography
Metrology and Imaging
Microfluidics
Modeling
Nanobiology
Nanoelectronics
Nanoimprint
Nanomechanics and Nanometrology
Nanophotonics
Nanostructures and Processing
Novel Imaging
Optical Lithography
Patterned Media and Data Storage
Resists
Topics in nanostructures and emerging technologies include:
Self assembly
Optical structures
Carbon nanotubes
Tip based processing
Graphene
ABSTRACT SUBMISSION
Abstract submission will be available online in early December at this location:
http://www.eipbn.org/abstract-submission/
The quality of the abstracts will form the basis for selection of papers for the conference
and will be peer reviewed according to the following criteria:
Originality of work
Specific results achieved and described
Potential impact and interest to the attendees
Abstract deadline: January 11, 2010 extended to Jan. 16, 2010.
Abstracts are limited to one page of text (12 point or larger type)
and a second, optional page with up to four figures.
To download an example of a formatted abstract, click here.
Late submissions may be considered but only if they report truly outstanding results.
Please prepare abstracts carefully and describe accomplishments specifically.
Authors will be notified of acceptance by April 12, 2010.
Earlier notification will be provided to those authors providing an e-mail address.
MICROGRAPH CONTEST
On a less technical level, EIPBN offers the opportunity to immortalize your favorite micrograph(s).
Categories and previous winners are described in more detail at the Micrograph Contest page.