IPEC 2012 - 2012 56th International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication (EIPBN)

Abstracts representing high quality original research are desired
for both poster and oral presentation
in the following areas:
Directed Self-Assembly
Electron Beams
Emerging Lithograpy & Patterning Technologies
Extreme UV Lithography (EUVL)
Focused Ion Beams
Mask and Maskless Lithography
Metrology and Imaging
Microfluidics
Modeling & Simulation
Nanobiology
Nanoelectronics
Nanoimprint
Nanomechanics and Nanometrology
Nanophotonics
Nanostructures and Processing
Novel Imaging
Optical Lithography
Patterned Media and Data Storage
Resists
Topics in nanostructures and emerging technologies include:
Self assembly
Photonic nano-structures
Carbon-based (carbon nanotubes & graphene)
Nano-Tip based patterning & processing
3DIC-enabled Nanofabrication
ABSTRACT SUBMISSION
Abstract submission is available online at the following location:
www.softconf.com/c/eipbn2012