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ISPC 2011 - International Symposium on Plasma Chemistry



VenuePhiladelph, USA - United States USA - United States



Topics/Call fo Papers

The 20th International Symposium on Plasma Chemistry will be held in Philadelphia USA at Loews Hotel July 24 - 29, 2011. ISPC is a bi-annual international conference with topics encompassing the whole area of plasma chemistry and processing science. The aim of the symposium is to present the recent progress in plasma chemistry and its applications.

The symposium will be organized to include planary lectures, invited and contributed oral presentations, poster sessions, and specially arranged oral sessions. The whole area of plasma processing from fundamentals to applications will be covered. Contributions are solicited in basic and application areas. The official language of the symposium is English.

Conference: Topics
1. Plasma Fundamentals, Diagnostics, and Modeling
2. Non-equilibrium Effects and Atmospheric Pressure Plasma Processes
3. Microdischarges and Microplasmas
4. Plasma Sources Designs and Characterizations
5. Plasma Processing for Microelectronics and Micromechanics, Plasma Clusters
6. Plasma Deposition and Processing of Inorganic Materials
7. Plasma Deposition and Treatment of Polymers
8. Plasma Assisted Combustion
9. Plasma Assisted Aerodynamics, Special Session
10. Plasma Biology and Medicine, Special Session
11. Plasmas in Liquids
12. Plasmas in Renewable Energies and Environmental Control

Last modified: 2010-10-10 18:50:27