Photomask Japan 2011 - 18th international symposium on photomasks and NGL masks

Photomask Japan 2011 is the 18th international symposium on photomasks and NGL masks in Japan. The aim of the symposium is to bring together engineers and investigators from Japan, USA, and all over the world in the field of photomasks, NGL masks, and related technologies to discuss recent progress, applications, and future trends. The conference program will feature invited papers, contributed papers, poster sessions, and a rump session with panel discussion. Display opportunities will be provided to mask manufacturing materials, and equipment companies.

Topics

Materials of and for Photomasks
Fabrication Process Steps and Equipments for Photomasks
(process and equipments for developing, etching, cleaning etc.)
Photomask Writing Tools and Technologies
Metrology Tools and Technologies
Inspection Tools and Technologies
Repairing Tools and Technologies
Mask Data Preparations
EDA and DFM for Photomask
Photomasks with RET: PSM, Masks with OPC
Photomask-relating Lithography Technologies
NGL Masks: EUV, Nano-imprint ML2 etc.
Mask Strategies and Business Challenges: Cost, Cycle-Time etc.