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RePa 2012 - Second International Workshop on Requirements Patterns

Date2012-09-24

Deadline2012-05-24

VenueChicago, USA - United States USA - United States

Keywords

Websitehttps://crisys.cs.umn.edu/re2012

Topics/Call fo Papers

Getting requirements right is critical to the success of any software development project, and yet oftentimes challenging and in need of a large amount of knowledge and experience. "Patterns" have been used to capture knowledge of software engineering, concerning software architectures, component designs and programs, and more recently requirements engineering. This workshop provides an open forum for researchers and practitioners to exchange ideas and experience, regarding pattern-based approaches to capturing, organizing, and reusing of all requirements engineering knowledge, from both process and product perspectives.
The RePa'12 Workshop solicits patterns that capture knowledge of requirements engineering processes and products. Examples of such patterns include, but not limited to, requirements modeling patterns, requirements engineering process/activity patterns, application/domain- specific requirements patterns, application/domain-independent requirements patterns, goal patterns, social patterns, scenario patterns (e.g. use cases, user stories), workflow patterns, business patterns, analysis patterns, functional requirements (FRs) patterns, non-functional requirements (NFRs) patterns, problem patterns (e.g. anti-patterns, mis-use patterns, fault patterns, attack patterns), and requirements to architecture/design mapping patterns.
This workshop also welcomes technical reports, including research and position papers, experience reports, empirical studies, case studies that report findings on requirements pattern-related topics, including, but not limited to, capturing, harvesting and mining, cataloging, organizing (e.g. by relationships such as uses, meta-pattern/occurrence, generalization/ specialization, and aggregation/decomposition), searching, selecting, reusing, applying requirements patterns, as well as pattern quality, management, and tool support.

Last modified: 2012-04-18 23:43:33