Photomask 2012 - 19th international symposium on photomasks and NGL masks (Photomask Japan 2012)

Photomask Japan 2012 is the 19th international symposium on photomasks and NGL masks in Japan. The aim of the symposium is to bring together engineers and investigators from Japan, USA, and all over the world in the field of photomasks, NGL masks, and related technologies to discuss recent progress, applications, and future trends. The conference program will feature invited papers, contributed papers, poster sessions, and a rump session with panel discussion. Display opportunities will be provided to mask manufacturing materials, and equipment companies.

Papers are solicited on the following and related topics:
- Materials of and for Photomasks
- Fabrication Process Steps and Equipments for Photomasks
(process and equipments for developing, etching, cleaning etc.)
- Photomask Writing Tools and Technologies
- Metrology / Inspection / Repairing Tools and Technologies
- Mask Degradation issues
- Mask Data Preparations
- EDA and DFM for Photomasks
- Photomasks with RET: PSM, Masks with OPC
- Photomask-relating Lithography Technologies
- EUV masks and Infrastructure
- NGL masks and Application: Nano-imprint, Patterned media etc.
- Strategies and Buisiness Challenges: Cost, Cycle-Time, ML2 etc.
- Photomasks for Flat Panel Display