ISPlasma 2012 - 4th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials (ISPlasma2012)

ISPlasma is specialized international symposium where more than 1,000 world-leading scientists and engineers can get together in the Tokai region (central Japan) to discuss latest researches in the fields of advanced plasma science, its application for processing and manufacturing of nitrides and nanomaterials, as well as new systems for industrial technological transfers. This symposium will address issues such as global warming, resources and energy problems where advanced plasma science and its application technology can serve. We aspire to contribute to the evolution of environmental science and green technology. By holding this symposium series, we aim to establish an advanced plasma science and technology center in this region that can collaborate with research institutes worldwide.

Official Language

The official language of ISPlasma2012 is English.

Related Fields

◆PLASMA　SCIENCE
・Plasma Source ・Advanced Plasma Measuring Technology
・Modeling and Simulation ・Etching Process
・Thin Film Deposition Process ・Flexible Electronics
・Plasma Biology and Medicine ・Plasma for Clean Energy
・Plasma for Nanotechnology

◆NITRIDE　SEMICONDUCTORS
・Crystal Growth of GaN and Related Materials ・MBE Groｗth of Nitrides
・Characterization ・Device Processing
・Optical Devices ・Electronic Devices

◆NANOMATERIALS
・Nanocarbon Materials ・Porous Materials
・Surface Modification/ Surface Functionalization ・Composite/ Functionally Grade Materials
・Nanoparticle/Nanowire/Nanorod ・Nanomaterials for Energy Applications